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45 nanometer

45 nanometer (45 nm) is the buzzword of choice (2007-2008) for an advanced semiconductor manufacturing process that Intel used for mass chip production, starting in late 2007. The 45 nanometer manufacturing process uses new materials, including hafnium-based high-k gate dielectrics and metal gates, to reduce electrical current leakage in transistors. Contrast with 90 nanometer.






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